The Plasmas and Nanomaterials Group, PLASNAMAT

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Equipment

Characterization Techniques

Mechanical Characterization

Optical Properties of thin films and surfaces

Optical Profilometry

Archivo_009

Spectroscopy Ellipsometer

Spectroscopy Ellipsometer

Electrochemical and Electrical characterization

General View of the Characterization Room

lab3

electric

Electrical Characterization (AC and DC)

potenciostatos

Electrochemical Characterization: Electrochemical Impedance, Potentiodynamic Polarization, Polarization Resistance, Cyclic Voltamperometry


Deposition Systems

General view of the physical deposition laboratory

lab2

General View of the Chemical synthesis Room

chemicalroom

Vapor Deposition

evaporadora

Two Inches Double Magnetron Sputtering

double mag

Four Inches Double Magnetron

double mag2

Deposition system with three chambers:  ultra-high vacuum chamber with a 4″ magnetron. The other chambers have been used for the development of novel deposition systems: a cylindrical hollow cathode and a planar hollow cathode

equipo2

Single chamber deposition system with two 4″ magnetrons

equipo3

Deposition Process

ch6

Submerged Arc for Metallic Nanoparticles

arc

Chemical Vapor Deposition

cvd

Vacuum Arc deposition

fermin2

Ultrasonic point

ultrasonic

Polishing machines to prepare metallic substrates

metallic

Equipo de Fotocatálisis y Fotoelectroquímica

Sistema de Producción de H2, acoplado a Cromatografo de Gases

Sistema para mediciones Fotoelectroquímica

Reactores fotocatalítico con luz visible


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