The Plasmas and Nanomaterials Group, PLASNAMAT

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2008

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  1. J. J. Olaya, S. E. Rodil, S. Muhl, Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering. Thin Solid Films 516 (23) 8319-8326 (2008). Citas: 1.
  2. J. J. Olaya, L. Huerta, S. E. Rodil, R. Escamilla, Superconducting Niobium Nitride films deposited by unbalanced magnetron sputtering. Thin Solid Films 516 (23), 8768-8773 (2008).
  3. F. Alibart, O. Durand-Drouhin, M. Benlahsen, S. Muhl, S. E. Rodil, E. Camps, L. Escobar-Alarcón. Comparison and Semiconductor Properties of Nitrogen doped Carbon Thin films grown by different techniques. Applied Surface Science 254, 5564- 5568 (2008). Citas: 1.
  4. F. Alibart, O. Durand Drouhin, M. Lejeune,m M. Benlahsen, S. E. Rodil, E. Camps, Evolution of the opto-electronic properties of amorphous carbon films as a function of nitrogen incorporation, Diamond and Related Materials 17, 925-930 (2008). Citas: 3.
  5. D. Turcio-Ortega, S. E. Rodil, S Muhl, Electrochemical behavior of Titanium thin films obtained by magnetron Sputtering. Materials Science (Medziagotyra) 14, 15-19 (2008). Citas: 1
  1. S. CALDERO, L. ESCOBAR-ALARCO, E. CAMPS, S.MUHL, M. RIVERA, I. BENTACOURT, J.OLAYA, A. MARIN, STRUCTURAL, MAGNETIC AND MAGNETO-ELECTRIC PROPERTIES OF La1-XSrXMNO3 THIN FILMS PREPARED BY PULSED LASER DEPOSITION,  MICROELECTRONICS JOURNAL 39 (2008) 1281–1283.
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